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Publisher: Elsevier

Volume 206, Number 1, 15 February 2003
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Editorial Board
pp. ii-ii(1)

Contents
pp. v-vi

Author Index
pp. I-III

Subject Index
pp. IV-XIII(1)

Scanning tunneling microscopy study of GaAs(1 0 0) surface prepared by HCl-isopropanol treatment
pp. 2-7(6)
Authors: Laukkanen P.; Kuzmin M.; Perala R.E.; Vaara R.-L.; Vayrynen I.J.

Ti3SiC2 formed in annealed Al/Ti contacts to p-type SiC
pp. 8-11(4)
Authors: Pecz B.; Toth L.; di Forte-Poisson M.A.; Vacas J.

Adsorption properties for urokinase on local diatomite surface
pp. 20-28(9)
Authors: Yang Y.; Zhang J.; Yang W.; Wu J.; Chen R.

Ultra thin Al2O3 films grown on Ni3Al(1 0 0)
pp. 29-36(8)
Authors: Podgursky V.; Costina I.; Franchy R.

Continuous wave ultraviolet radiation induced frustration of etching in lithium niobate single crystals
pp. 46-52(7)
Authors: Mailis S.; Riziotis C.; Smith P.G.R.; Scott J.G.; Eason R.W.

Electron conduction mechanism of Si(1 0 0)/Ag and Si(1 0 0)/H/Ag
pp. 60-66(7)
Authors: Iida S.; Hiraoka A.; Noritake H.; Tanaka R.; Yukawa M.

The comparative characterization of structural heterogeneity of mesoporous activated carbon fibers (ACFs)
pp. 67-77(11)
Authors: Kowalczyk P.; Gun'ko V.M.; Terzyk A.P.; Gauden P.A.; Rong H.; Ryu Z.; Do D.D.

The influence of gas phase composition on the process of Au-Hg amalgam formation
pp. 78-89(12)
Authors: Kobiela T.; Nowakowski B.; Dus R.

Copper oxide reduction through vacuum annealing
pp. 102-109(8)
Authors: Lee S.Y.; Mettlach N.; Nguyen N.; Sun Y.M.; White J.M.

Changes in chemical behavior of thin film lead zirconate titanate during Ar+-ion bombardment using XPS
pp. 119-128(10)
Authors: Kim J.-N.; Shin K.-S.; Kim D.-H.; Park B.-O.; Kim N.-K.; Cho S.-H.

Phase transformation in room temperature pulsed laser deposited TiO2 thin films
pp. 137-148(12)
Authors: Sharma A.K.; Thareja R.K.; Willer U.; Schade W.

Study of stress effects in the oxidation of phosphated alpha-iron: in situ measurement by diffraction of synchrotron radiation
pp. 149-158(10)
Authors: Panicaud B.; Grosseau-Poussard J.L.; Renault P.O.; Dinhut J.F.; Thiaudiere D.; Gailhanou M.

Titanium disilicide formation by rf plasma enhanced chemical vapor deposition and film properties
pp. 159-166(8)
Authors: Fouad O.A.; Yamazato M.; Ichinose H.; Nagano M.

Enhancement of field emission in carbon nanotubes through adsorption of polar molecules
pp. 167-177(11)
Authors: Grujicic M.; Cao G.; Gersten B.

High energy ion irradiation induced surface roughening in Ag and Cu films
pp. 178-186(9)
Authors: Crespo-Sosa A.; Munoz M.; Cheang-Wong J.-C.; Oliver A.; Saniger J.M.; Banuelos J.G.

Emission of CsM+ clusters
pp. 187-195(9)
Authors: Kudriavtsev Y.; Villegas A.; Godines A.; Asomoza R.

Ultrathin poly(ethylene glycol) films for silicon-based microdevices
pp. 218-229(12)
Authors: Sharma S.; Johnson R.W.; Desai T.A.

XPS study on double glow plasma corrosion-resisting surface alloying layer
pp. 230-236(7)
Authors: Ai J.; Xu J.; He F.; Xie X.; Xu Z.

Surface chemical modification of silica aerogels using various alkyl-alkoxy/chloro silanes
pp. 262-270(9)
Authors: Rao A.V.; Kulkarni M.M.; Amalnerkar D.P.; Seth T.

Chemical bonding of magnetron-sputtered copper on PECVD amorphous SiCOF film
pp. 321-330(10)
Authors: Ding S.-J.; Zhang D.W.; Wang J.-T.; Lee W.W.

Formation of monoatomic chains of metallic elements
pp. 331-335(5)
Authors: Jiang Q.; Zhao M.; Li J.C.

Dynamical thermal model for thin metallic film-substrate system with resistive heating
pp. 336-344(9)
Authors: Aviles F.; Oliva A.I.; Aznarez J.A.

Factors influencing phase compositions and structure of plasma sprayed hydroxyapatite coatings during heat treatment
pp. 345-354(10)
Authors: Lu Y.-P.; Song Y.-Z.; Zhu R.-F.; Li M.-S.; Lei T.-Q.

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